Ultrafast Laser Source
Femtosecond Laser Two-Photon Micro/Nano Processing System
Ultrafast Laser Equipment
Product overview
Product Summary
Femtosecond laser two-photon micro/nanofabrication system for microfluidic chips, photonic chips, and processing of micro/nanostructures, supporting 343 nm, 515 nm, 1030 nm, or multi-wavelength operation.
Technical profile
Key Specifications
| Parameter | Specification |
|---|---|
| System weight | ~450 kg |
| Overall dimensions | 600×90×1000 mm³ |
| Wavelength configuration | 343 nm / 515 nm / 1030 nm or multi-wavelength operation |
Product characteristics
Product Highlights
The Femtosecond Laser Two-Photon Micro/Nano Processing System supports microfluidic chip fabrication, two-photon polymerization processing of microstructures, and photonic chip fabrication. It supports 343 nm, 515 nm, 1030 nm, or multi-wavelength operation.
The system provides high-precision super-resolution processing and free-form graphical editing for arbitrary two-dimensional or three-dimensional micro/nanostructures. Contact us to confirm the specific wavelength combination, processing configuration, and applicable conditions.
- High-power, high-energy femtosecond light source
- High-precision super-resolution processing for microstructures at the hundred-nanometer scale
- Free-form graphical editing for arbitrary two-dimensional or three-dimensional micro/nanostructures
Application fields
Applications
- Microfluidic chip fabrication
- Two-photon polymerization processing of microstructures
- Photonic chip fabrication
- Direct writing of optical waveguides, grating writing, and material modification
- Surface modulation and structural coloration
Related products
Related Products
10-Microjoule Narrow-Pulse Femtosecond Laser
1030nm Ultranarrow-Pulse Femtosecond Fiber Laser
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