Ultrafast Laser Source
Hundred-Microjoule High-Energy Femtosecond Laser
Ultrafast Lasers
Product overview
Product Summary
Hundred-microjoule high-energy femtosecond laser with a highly integrated all-fiber module architecture, pulse width below 220 fs, and adjustable repetition rate from 1 Hz to 1 MHz.
Technical profile
Key Specifications
| Parameter | Specification |
|---|---|
| System dimensions | 860 × 410 × 143 mm³ |
| Pulse width | <220 fs |
| Repetition rate | Adjustable from 1 Hz–1 MHz |
| Architecture | Highly integrated all-fiber module architecture |
| Beam and power | Excellent beam quality and power stability |
Product characteristics
Product Highlights
The hundred-microjoule high-energy femtosecond laser uses a highly integrated all-fiber module architecture, with pulse width below 220 fs and repetition rate adjustable from 1 Hz–1 MHz. It features excellent beam quality and power stability.
Application directions include micro/nanofabrication, semiconductor processing, wafer dicing, optoelectronic display panel repair, crystal etching, chip processing, and photonic-chip fabrication. Contact us to confirm the specific configuration, suitability, application requirements, and supply details.
- Highly integrated all-fiber module architecture
- Ultrashort pulse width below 220 fs
- Repetition rate adjustable from 1 Hz–1 MHz
- Excellent beam quality and power stability
Application fields
Applications
- Micro/nanofabrication and semiconductor processing
- Wafer dicing, optoelectronic display panel repair, and crystal etching
- Chip processing and photonic-chip fabrication
Related products
Related Products
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